MOS管导通(tong)压(ya)降(jiang)多(duo)大-MOS管的导通(tong)条件、过程(cheng)介绍-KIA MOS管
信息来源(yuan):本站 日期(qi):2018-07-25
金属-氧(yang)化层?半(ban)导体场效晶(jing)体管(guan)(guan),简称(cheng)金氧(yang)半(ban)场效晶(jing)体管(guan)(guan)(Metal-Oxide-Semiconductor?Field-Effect?Transistor,?MOSFET)是一种可(ke)以广泛使用(yong)在模拟电(dian)路(lu)与(yu)数字电(dian)路(lu)的场效晶(jing)体管(guan)(guan)(field-effect?transistor)。MOSFET依(yi)照其“通(tong)道”的极性不同,可(ke)分为(wei)(wei)“N型”与(yu)“P型”?的MOSFET,通(tong)常(chang)又称(cheng)为(wei)(wei)NMOSFET与(yu)PMOSFET,其他(ta)简称(cheng)尚(shang)包括NMOS?FET、PMOS?FET、nMOSFET、pMOSFET等。
MOS管(guan)的(de)source和(he)drain是(shi)(shi)可以对(dui)调的(de),他们都是(shi)(shi)在P型(xing)backgate中形(xing)成的(de)N型(xing)区。在多(duo)数情况下,这个两个区是(shi)(shi)一样的(de),即使两端对(dui)调也不会影响器(qi)件的(de)性能。这样的(de)器(qi)件被认为(wei)是(shi)(shi)对(dui)称的(de)。和(he)晶体(ti)管(guan)不一样,MOS管(guan)的(de)参(can)数中没有直接给(ji)出(chu)管(guan)压降,而是(shi)(shi)给(ji)出(chu)导通电阻Rds(on),SI2301的(de)导通电阻在Dd=3.6A时(shi)是(shi)(shi)85mΩ,在Id=2A时(shi)是(shi)(shi)115mΩ,这样可算出(chu)它的(de)管(guan)压降在3.6A和(he)2A时(shi)分(fen)别(bie)为(wei)0.306V和(he)0.23V。
导(dao)(dao)通(tong)的(de)意思是作(zuo)为开(kai)关,相当于开(kai)关闭合。NMOS的(de)特(te)性,Vgs大于一(yi)(yi)定的(de)值就(jiu)会导(dao)(dao)通(tong),适合用于源极接地时(shi)(shi)的(de)情况(kuang)(低(di)端驱动(dong)),只(zhi)要(yao)栅极电压(ya)达(da)到(dao)4V或10V就(jiu)可以(yi)了。?PMOS的(de)特(te)性,Vgs小于一(yi)(yi)定的(de)值就(jiu)会导(dao)(dao)通(tong),使(shi)用与源极接VCC时(shi)(shi)的(de)情况(kuang)(高端驱动(dong))。但是,虽然PMOS可以(yi)很方(fang)便地用作(zuo)高端驱动(dong),但由于导(dao)(dao)通(tong)电阻大,价格贵,替换种类少等原因,在(zai)高端驱动(dong)中,通(tong)常(chang)还(hai)是使(shi)用NMOS。
如图一(yi)个用(yong)于(yu)信号(hao)控制(zhi)的(de)(de)小(xiao)(xiao)(xiao)功(gong)率N沟道MOS管2N7000,当(dang)Rds(on)是MOS管导(dao)通(tong)时(shi)(shi)(shi),D极(ji)和S极(ji)之间(jian)的(de)(de)内生(sheng)(sheng)(sheng)电(dian)阻,它的(de)(de)存在会产(chan)(chan)生(sheng)(sheng)(sheng)压降,所以越(yue)小(xiao)(xiao)(xiao)越(yue)好。D极(ji)与S极(ji)间(jian)电(dian)流(liu)Id最大(da)时(shi)(shi)(shi)完(wan)全(quan)导(dao)通(tong)。在图中可以看到Vgs=10v完(wan)全(quan)导(dao)通(tong),电(dian)阻Rds=5欧(ou)左(zuo)右,电(dian)流(liu)Id=500mA(最大(da),完(wan)全(quan)导(dao)通(tong)),产(chan)(chan)生(sheng)(sheng)(sheng)压降Vds=2.5v。而Vgs=4.5v时(shi)(shi)(shi),Id=75mA(不是最大(da),没完(wan)全(quan)导(dao)通(tong)),Rds=5.3欧(ou)左(zuo)右,虽然没完(wan)全(quan)导(dao)通(tong),但(dan)产(chan)(chan)生(sheng)(sheng)(sheng)的(de)(de)压降Vds=0.4v最小(xiao)(xiao)(xiao),比Vgs=10v产(chan)(chan)生(sheng)(sheng)(sheng)的(de)(de)压降小(xiao)(xiao)(xiao)得多。对于(yu)信号(hao)控制(zhi)(控制(zhi)DS极(ji)导(dao)通(tong)接地实现高低平(ping))来(lai)说(shuo)只(zhi)要(yao)电(dian)压,不需要(yao)电(dian)流(liu)(为什么(me)?这里是信号(hao)和电(dian)源的(de)(de)区别,基础(chu)很重要(yao),这里不做解释,不懂的(de)(de)请(qing)先恶补一(yi)下(xia)基础(chu)),所以只(zhi)要(yao)求MOS管导(dao)通(tong)时(shi)(shi)(shi)产(chan)(chan)生(sheng)(sheng)(sheng)的(de)(de)压降越(yue)小(xiao)(xiao)(xiao)越(yue)好,可以使D极(ji)的(de)(de)电(dian)压直接被拉(la)为接近0v,因此首选Vgs=4.5v左(zuo)右,而不选10v。有些用(yong)于(yu)信号(hao)控制(zhi)的(de)(de)MOS管如2N7002K,Vgs为10V和4.5V时(shi)(shi)(shi)产(chan)(chan)生(sheng)(sheng)(sheng)的(de)(de)压降差不多,可以根据(ju)情况选择(ze)(ze)10v或者4.5v左(zuo)右的(de)(de)导(dao)通(tong)电(dian)压。因此对信号(hao)控制(zhi)来(lai)说(shuo),原(yuan)则(ze)上是选择(ze)(ze)导(dao)通(tong)时(shi)(shi)(shi)产(chan)(chan)生(sheng)(sheng)(sheng)的(de)(de)压降越(yue)小(xiao)(xiao)(xiao)越(yue)好。
那么对于使用在(zai)电源控制方面,既需(xu)要电压也需(xu)要电流的大功(gong)率(lv)MOS管来说,就(jiu)需(xu)要完全导(dao)通(tong),那么导(dao)通(tong)电压是多少呢?我们(men)再(zai)来看一个大功(gong)率(lv)N沟道(dao)MOS管AO1428A,如下图
从(cong)图中可以看出Vgs为10v和4.5v时,Id为12.4A,都达(da)到(dao)最大(da),都可完全(quan)导(dao)通(tong)(tong)。但10v比4.5v的(de)(de)导(dao)通(tong)(tong)电阻小,产生压降小(大(da)约差0.7v),并(bing)且10v的(de)(de)开(kai)关速度快,损失的(de)(de)能量(liang)少,开(kai)关效率(lv)高,所(suo)以首选10v。至于(yu)(yu)P沟(gou)道MOS管,跟N沟(gou)道的(de)(de)差不(bu)多,这(zhei)时不(bu)做解析了,它用在信号控制(zhi)方面的(de)(de)很少,主要是用在电源控制(zhi)如(ru)AO4425,G极电压必(bi)须低(di)于(yu)(yu)S极10V以上(shang),也(ye)就是Vgs《-10v,才能完全(quan)导(dao)通(tong)(tong)(Rds= 9 mΩ左右)。如(ru)下图
总结:信号控(kong)制使用(yong)的(de)MOS管,只要电(dian)压(ya),不需要电(dian)流(liu),要求导通时(shi)产(chan)(chan)生(sheng)的(de)压(ya)降Vds最小(xiao),首(shou)选Vgs=4.5v左(zuo)右,对信号控(kong)制来说,原则上是(shi)选择导通时(shi)产(chan)(chan)生(sheng)的(de)压(ya)降越小(xiao)越好。电(dian)源控(kong)制使用(yong)的(de)MOS管,既(ji)要电(dian)压(ya)也要电(dian)流(liu),要求完(wan)全导通,要求Id最大,产(chan)(chan)生(sheng)的(de)压(ya)降Vds最小(xiao),首(shou)选Vgs=10v左(zuo)右。
如(ru)何把Mos管导通(tong)时电压降(jiang)控制在最小(xiao)?
在用FDS6890A型号N-mos,用作(zuo)开(kai)关,漏极加10伏(fu)(fu)电压,栅极加0到5伏(fu)(fu)方波控制导通(tong)闭(bi)合(he),但是(shi)测量源极电压时(shi)候只有0到8伏(fu)(fu)的方波输出(chu)。
怎(zen)么提高Mos管效率,或(huo)者是(shi)用一些高级点的电路?
首先要了解MOS管(guan)的(de)工(gong)(gong)作(zuo)(zuo)原(yuan)理。MOS管(guan)与一(yi)般(ban)晶体(ti)三极(ji)(ji)(ji)管(guan)是(shi)不同(tong)的(de)。它是(shi)电(dian)压(ya)控(kong)(kong)制(zhi)元件(jian),它是(shi)栅极(ji)(ji)(ji)电(dian)压(ya)控(kong)(kong)制(zhi)的(de)是(shi)S-D极(ji)(ji)(ji)间的(de)体(ti)电(dian)阻。在栅极(ji)(ji)(ji)施加(jia)不同(tong)的(de)电(dian)压(ya),源(yuan)-漏(lou)极(ji)(ji)(ji)之间就会有电(dian)阻的(de)变化(hua),这就是(shi)MOS管(guan)的(de)工(gong)(gong)作(zuo)(zuo)原(yuan)理。栅极(ji)(ji)(ji)电(dian)压(ya)对应(ying)在器件(jian)S-D极(ji)(ji)(ji)的(de)电(dian)阻变化(hua)曲(qu)线可以查器件(jian)手(shou)册。根据(ju)MOS管(guan)的(de)这个特性,既可以选择将MOS管(guan)作(zuo)(zuo)放大器工(gong)(gong)作(zuo)(zuo),也(ye)可以选择作(zuo)(zuo)为开(kai)关工(gong)(gong)作(zuo)(zuo)。
根据以上原理分析,在你(ni)的(de)问题中,如果要使(shi)MOS管作在开关状态,就要对(dui)栅(zha)(zha)极施加足够的(de)电(dian)压(ya)(ya),它才能充分起到开关作用。你(ni)在栅(zha)(zha)极施加的(de)电(dian)压(ya)(ya)只有(you)5V(对(dui)于单管而言我认(ren)为栅(zha)(zha)极电(dian)压(ya)(ya)低了,一般应该在12V左右比较好),这个电(dian)压(ya)(ya)下MOS管的(de)夹断(duan)电(dian)阻依然(ran)比较大,所以输出只有(you)8V。
导(dao)通(tong)与截止由栅源(yuan)电压来(lai)控制(zhi),对于增(zeng)(zeng)(zeng)强型(xing)场效(xiao)应(ying)管来(lai)说,N沟道的(de)管子(zi)加正向电压即(ji)导(dao)通(tong),P沟道的(de)管子(zi)则加反向电压。一般2V~4V就可以(yi)了(le)。但是(shi),场效(xiao)应(ying)管分(fen)为增(zeng)(zeng)(zeng)强型(xing)(常开型(xing))和耗尽(jin)(jin)型(xing)(常闭型(xing)),增(zeng)(zeng)(zeng)强型(xing)的(de)管子(zi)是(shi)需(xu)要加电压才能(neng)导(dao)通(tong)的(de),而耗尽(jin)(jin)型(xing)管子(zi)本来(lai)就处(chu)于导(dao)通(tong)状态,加栅源(yuan)电压是(shi)为了(le)使(shi)其截止。
开(kai)关只(zhi)有(you)两种(zhong)状态通和(he)(he)断,三极管(guan)和(he)(he)场效应管(guan)工作有(you)三种(zhong)状态:
1、截止;
2、线(xian)性(xing)放(fang)大;
3、饱和(基极电(dian)(dian)流(liu)(liu)继续增加而(er)集电(dian)(dian)极电(dian)(dian)流(liu)(liu)不再增加);
使晶(jing)体(ti)管(guan)(guan)(guan)只工作在(zai)1和(he)(he)3状态(tai)的(de)电(dian)(dian)(dian)路(lu)称之为开关(guan)电(dian)(dian)(dian)路(lu),一般以(yi)晶(jing)体(ti)管(guan)(guan)(guan)截止(zhi),集电(dian)(dian)(dian)极不(bu)吸收电(dian)(dian)(dian)流表示(shi)关(guan);以(yi)晶(jing)体(ti)管(guan)(guan)(guan)饱和(he)(he),发射极和(he)(he)集电(dian)(dian)(dian)极之间的(de)电(dian)(dian)(dian)压差接(jie)(jie)近于0V时(shi)(shi)表示(shi)开。开关(guan)电(dian)(dian)(dian)路(lu)用于数(shu)字电(dian)(dian)(dian)路(lu)时(shi)(shi),输出电(dian)(dian)(dian)位接(jie)(jie)近0V时(shi)(shi)表示(shi)0,输出电(dian)(dian)(dian)位接(jie)(jie)近电(dian)(dian)(dian)源(yuan)电(dian)(dian)(dian)压时(shi)(shi)表示(shi)1。所以(yi)数(shu)字集成电(dian)(dian)(dian)路(lu)内部的(de)晶(jing)体(ti)管(guan)(guan)(guan)都工作在(zai)开关(guan)状态(tai)。 场(chang)效应(ying)管(guan)(guan)(guan)按沟(gou)道(dao)分可分为N沟(gou)道(dao)和(he)(he)P沟(gou)道(dao)管(guan)(guan)(guan)(在(zai)符(fu)号图中可看(kan)到中间的(de)箭头方向(xiang)不(bu)一样)。
按材料(liao)分可分为(wei)结型(xing)(xing)(xing)管(guan)(guan)(guan)和(he)绝缘(yuan)栅型(xing)(xing)(xing)管(guan)(guan)(guan),绝缘(yuan)栅型(xing)(xing)(xing)又分为(wei)耗(hao)(hao)尽型(xing)(xing)(xing)和(he)增强型(xing)(xing)(xing),一般主板(ban)上大多是(shi)(shi)绝缘(yuan)栅型(xing)(xing)(xing)管(guan)(guan)(guan)简(jian)称(cheng)MOS管(guan)(guan)(guan),并且大多采用增强型(xing)(xing)(xing)的N沟道(dao),其次是(shi)(shi)增强型(xing)(xing)(xing)的P沟道(dao),结型(xing)(xing)(xing)管(guan)(guan)(guan)和(he)耗(hao)(hao)尽型(xing)(xing)(xing)管(guan)(guan)(guan)几乎不(bu)用。场效应(ying)(ying)晶体(ti)管(guan)(guan)(guan)(Field Effect Transistor缩写(FET))简(jian)称(cheng)场效应(ying)(ying)管(guan)(guan)(guan).由多数(shu)载流子参与(yu)导(dao)电(dian),也称(cheng)为(wei)单极(ji)(ji)(ji)型(xing)(xing)(xing)晶体(ti)管(guan)(guan)(guan).它属(shu)于(yu)电(dian)压控制型(xing)(xing)(xing)半(ban)导(dao)体(ti)器件(jian).场效应(ying)(ying)管(guan)(guan)(guan)是(shi)(shi)利(li)用多数(shu)载流子导(dao)电(dian),所以称(cheng)之为(wei)单极(ji)(ji)(ji)型(xing)(xing)(xing)器件(jian),而晶体(ti)管(guan)(guan)(guan)是(shi)(shi)即有多数(shu)载流子,也利(li)用少数(shu)载流子导(dao)电(dian),被称(cheng)之为(wei)双极(ji)(ji)(ji)型(xing)(xing)(xing)器件(jian).有些场效应(ying)(ying)管(guan)(guan)(guan)的源极(ji)(ji)(ji)和(he)漏极(ji)(ji)(ji)可以互换(huan)使用,栅压也可正可负(fu),灵活(huo)性比晶体(ti)管(guan)(guan)(guan)好。
导(dao)通时序可(ke)分为(wei)to~t1、t1~t2、 t2~t3 、t3~t4四(si)个时间段,这(zhei)四(si)个时间段有(you)不同的等(deng)效电路。
1)t0-t1:C GS1 开始(shi)充电(dian),栅极电(dian)压还没有到达V GS(th),导电(dian)沟道(dao)没有形成,MOSFET仍处于关闭状态。
2)[t1-t2]区间(jian)(jian), GS间(jian)(jian)电(dian)压到(dao)达Vgs(th),DS间(jian)(jian)导(dao)电(dian)沟道开始形成,MOSFET开启(qi),DS电(dian)流增(zeng)加到(dao)ID, Cgs2 迅(xun)速(su)充电(dian),Vgs由Vgs(th)指(zhi)数(shu)增(zeng)长到(dao)Va。
3)[t2-t3]区间(jian),MOSFET的(de)DS电(dian)(dian)压(ya)降至与Vgs相(xiang)同,产生Millier效应(ying),Cgd电(dian)(dian)容(rong)大大增(zeng)加(jia)(jia),栅极电(dian)(dian)流持续(xu)流过(guo),由于C gd 电(dian)(dian)容(rong)急剧增(zeng)大,抑制了栅极电(dian)(dian)压(ya)对Cgs 的(de)充电(dian)(dian),从而使得Vgs 近乎水平状态,Cgd 电(dian)(dian)容(rong)上电(dian)(dian)压(ya)增(zeng)加(jia)(jia),而DS电(dian)(dian)容(rong)上的(de)电(dian)(dian)压(ya)继续(xu)减(jian)小。
4)[t3-t4]区间,至(zhi)(zhi)t3时刻,MOSFET的DS电(dian)(dian)(dian)压(ya)降至(zhi)(zhi)饱和导(dao)通(tong)时的电(dian)(dian)(dian)压(ya),Millier效应影响(xiang)变(bian)小(xiao),Cgd 电(dian)(dian)(dian)容变(bian)小(xiao)并和Cgs 电(dian)(dian)(dian)容一起(qi)由(you)外部驱(qu)动电(dian)(dian)(dian)压(ya)充电(dian)(dian)(dian), Cgs 电(dian)(dian)(dian)容的电(dian)(dian)(dian)压(ya)上升(sheng),至(zhi)(zhi)t4时刻为止.此时C gs 电(dian)(dian)(dian)容电(dian)(dian)(dian)压(ya)已达稳态,DS间电(dian)(dian)(dian)压(ya)也(ye)达最小(xiao),MOSFET完(wan)全开启。
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